Epiluvac is a leading brand in the field of chemical vapor deposition (CVD) reactors. Their hot-wall CVD reactors utilize a unique technology that offers numerous advantages. By heating the reactor chamber externally and utilizing radiation from the heated walls to heat the substrate, Epiluvac achieves exceptional substrate temperature uniformity, resulting in uniform coating thickness.

Epiluvac's CVD reactors are specially designed to fully harness the strengths of the hot-wall principle. Their engineering team were early pioneers in Silicon Carbide (SiC) epitaxy, making them experts in achieving excellent wafer uniformity. Epiluvac has also developed innovative solutions to address common challenges associated with hot-wall reactors.

Through the design of the reactor chamber and gas system, they have minimized the risk of deposition on the chamber walls and other system parts, reducing the need for frequent cleaning. With individually controllable heating zones, advanced gas injection, and an automatic hot wafer loader, Epiluvac's CVD reactors offer optimized cell temperature profiling, adjustable growth rates, and high throughput. Thanks to their clean inert atmosphere wafer transfer and pre-loaded wafers, Epiluvac minimizes particle contamination and allows for unattended process runs, improving efficiency.

Epiluvac was recently acquired by Veeco Instruments Inc., a publicly-head company, expanding their expertise and product offerings. This acquisition has allowed Veeco to provide standard and customized reactor solutions, including specialized designs for graphene and nanowire manufacturing. With a strong focus on customer satisfaction, Epiluvac also offers comprehensive service and maintenance packages.

Choose Epiluvac for cutting-edge CVD reactor technology and reliable solutions for your semiconductor and compound semiconductor manufacturing needs