@rasirc.com
RASIRC leads in dynamic gas generation - enabling next generation semiconductor processes Rasirc: Enabling next generation semiconductor processes
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Description
RASIRC is a leading brand in dynamic gas generation, specializing in enabling next-generation semiconductor processes. Their innovative products and services revolutionize the semiconductor industry by providing precise control and reliability in gas generation. RASIRC offers a range of cutting-edge products that cater to various semiconductor applications.
Their BRUTE Hydrazine product converts liquid hydrazine into pure, dry, and safer hydrazine gas, enabling low-temperature nitride ALD with low resistivity and minimal oxygen contamination. The BRUTE Peroxide is another remarkable product that can be used for surface functionalization, passivation, and area selective deposition, delivering a dense hydroxylated surface without oxidizing the sub-surface. Additionally, RASIRC's Peroxidizer converts liquid hydrogen peroxide into hydrogen peroxide gas, which is highly versatile and has multiple applications in next-generation devices.
Their RainMaker Humidification System (RHS) is a game-changer, converting water into particle-free water vapor, perfect for oxidation and annealing processes. RASIRC's innovative gas generation products enable new process innovation, facilitating the growth of thin oxide and nitride films at reduced temperatures. These films are vital in the production of complex 3D structures found in advanced microprocessors, memory devices, and III-V nitride devices.
With their expertise and commitment to excellence, RASIRC is at the forefront of enabling next-generation semiconductor processes. Contact them today to discover how their products can transform your semiconductor applications
Company Type
Privately Held
Company Size
11-50
Year Founded
2005
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